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Light chamber design -Special materials to ensure that the light chamber deforms to minimum |
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Pasing Longge structure with diameter
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Roland circle being 400mm
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Wavelength range
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134-680nm
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Pixel resolution
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10pm
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Constant temperature
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32.5 ±0.5°C
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Concave Grating
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Engraved line density
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2400l/mm
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Primary spectral line dispersion rate
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1.04nm/mm
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Working Conditions
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Working temperature
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15-30 °C
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Relative humidity
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≤70%
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Power supply
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220±5V, single-phase 50Hz, grounding resistance <10
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The laboratory is expected to have no vibration, dust, strong electromagnetic interference, strong airflow, or corrosive gas.
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Excitation light source
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High energy plasma spark light source technology
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High-energy pre-sparking technology (HEPS)
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Frequency
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100-1000Hz
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Excitation Platform
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3mm analysis spacing on sample platform
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Spray electrode technique
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Dimension/Weight
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H435mm, L900mm, W 600mm
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120 kg
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Power
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Maximum power
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1500 W
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Standby power
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70 W
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Detector
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High-performance linear array CMOS
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Analysis time
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30 seconds or less, depending on sample type
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