Customization: | Available |
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After-sales Service: | Online Technical Support |
Application: | Laboratory Apparatus |
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High-frequency generator | |
Circuit type | All solid-state RF power supply Input power supply: 220V,30A |
Operating Frequency | 27.12MHz |
Frequency Stability | <0.01% |
Output power | 800W~1500W |
Output power stability | ≤0.01% |
Electromagnetic field leakage radiation intensity | At a distance of 30cm from the chassis, electric field:E< 10V/m: Magnetic field:H < 0.2A/m |
Gas control flow rate size | Plasma gas flow meter:(l~20)L/min Auxiliary gas flow meter.(0.05~1.0)L/min Carrier gas flow meter :(0.05~1.0)L/min |
Cooling water | The water temperature range is 20 °C~25 °C, the flow rate is greater than 7 L/min, the water pressure is greater than 0.1MPa, and the cooling water resistance is greater than1MΩ |
Polychromator | |
light path | Middle step grating+prism cross dispersion type |
Focal length | 440mm |
Grating specifications | Echelle grating |
Wavelength range | 175nm~870nm |
Nitrogen purge | High speed blowing 6L/min, normal blowing 2L/min |
CCD | |
Detection wavelength range | l65nm ~ 900nm |
Quantum efficiency | >30%@200nm |
Refrigeration temperature | -45ºC |
Nitrogen purging flow rate | 3L/min |
Technicalindicators of the entire machine | |
Wavelength range | 175nm~900nm |
Repeatability | Relative standard deviation RSD < l.5 % |
Stability | Relative standard deviation RSD < l.0 % |